1. Skeleton-based OPC application for DSA full chip mask correction;Schneider,2015
2. DFM for defect-free DSA hole shrink process;Fukawatase,2014
3. Template affinity role in CH shrink by DSA planarization;Tiron,2015
4. Enabling 22-nm logic node with advanced RET solutions;Farys,2011
5. Process optimization of templated DSA flows;Gronheid,2014