1. Bias-Free Measurement of LER/LWR with Low Damage by CD-SEM;Yamaguchi,2006
2. Self-aligned-quadruple-patterning for N7/N5 silicon fins;Altamirano-Sánchez,2016
3. EUV Processing and Characterization for BEOL;Saulnier,2015
4. Correlation length and the problem of Line Width Roughness;Constantoudis,2007