Author:
Yagawa Keisuke,Ugajin Kunihiro,Suenaga Machiko,Kanamitsu Shingo,Motokawa Takeharu,Hagihara Kazuki,Arisawa Yukiyasu,Kobayashi Sachiko,Saito Masato,Ito Masamitsu
Reference5 articles.
1. UV-NIL templates for the 22nm node and beyond;Hiraka,2007
2. “International Technology Roadmap for Semiconductors 2013 Edition”.
3. Potential of mask production process for finer pattern fabrication
4. High performance mask fabrication process for the next-generation mask production;Yagawa,2013
5. EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond;Takekoshi,2014