Maskless beam pen lithography based on integrated microlens array and spatial-filter array
Author:
Affiliation:
1. National Cheng Kung University, Department of Mechanical Engineering, Tainan
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference21 articles.
1. Pushing the limits of lithography
2. High speed maskless lithography of printed circuit boards using digital micromirrors
3. Beam pen lithography based on focused laser diode beam with single microlens fabricated by excimer laser
4. Emerging digital micromirror device (DMD) applications
5. Imaging simulation of maskless lithography using a DMD
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2. Ultraviolet Beam Lithography System for Digital Fabrication of Roller Molds;IEEE/ASME Transactions on Mechatronics;2021-02
3. Maskless lithography based on oblique scanning of point array with digital distortion correction;Optics and Lasers in Engineering;2021-01
4. Three Dimensional Maskless Ultraviolet Exposure System Based on Digital Light Processing;International Journal of Precision Engineering and Manufacturing;2020-01-16
5. A Microlens Super-Surface Film with Regular Graded Circular Hole-Like Subwavelength Structures for Highly Focusing Strength;Coatings;2019-11-21
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