Effects of sputtering parameters and separator plates on the structure and stress of W/Si multilayers in x-ray telescope applications

Author:

Qi Runze1,Huang Qiushi1,Yang Yang1,Zhang Zhong1,Wang Zhanshan1

Affiliation:

1. Tongji University, Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Shanghai, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

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3. Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering;Frontiers in Physics;2022-03-10

4. High reflectivity Co/Mg multilayer working in the broad soft x-ray range of 350–770 eV;Journal of Physics D: Applied Physics;2022-02-02

5. Ni-Ti supermirror coated onto a curved substrate for nested neutron-focusing optics;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2021-01

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