193nm high power lasers for the wide bandgap material processing-Reference-Cited by-同舟云学术

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193nm high power lasers for the wide bandgap material processing

Published:2017-02-22 Issue: Volume: Page:
ISSN:0277-786X
Container-title:High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI
language:
Short-container-title:

Author:

Fujimoto Junichi¹,Kobayashi Masakazu¹,Kakizaki Koji¹,Oizumi Hiroaki¹,Mimura Toshio¹,Matsunaga Takashi¹,Mizoguchi Hakaru¹

Affiliation:

1. Gigaphoton Inc. (Japan)

Publisher

SPIE

Reference5 articles.

1. Development of DUV hybrid excimer laser for high quality and high power processing;Fujimoto,2016

2. Development of high coherence high power 193 nm laser;Tanaka,2016

3. Excimer laser micro machining of inorganic dielectrics

4. Fabrication of 250-nm-hole arrays in glass and fused silica by UV laser ablation

5. High power DUV lasers for material processing;Mimura,2016

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1. Comparison of Materials for Deep-Ultraviolet Optical Isolator;2022 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR);2022-07-31

2. Research Progresses on Vacuum-Ultraviolet 193-nm Band Solid-State Lasers;ACTA OPT SIN;2022

3. Recent Trend of High Repetition Rate Ultrashort Laser Pulse Generation and Frequency Conversion;CHIN J LASERS;2021

4. Wavelength dependence of the Verdet constant in synthetic quartz glass for deep-ultraviolet light sources;Optical Materials Express;2021-02-17

5. Linearly-polarized pulsed Nd-doped fiber MOPA at 905 nm and frequency conversion to deep-UV at 226 nm;Optics Express;2021-01-26

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