1. Mask assisted off-axis illumination technique for random logic;Garofalo,1993
2. DOF enhancement of isolated line patterns by newly developed assist pattern method;Matsuura,1997
3. Effects of sub-resolution assist features on depth of focus and uniformity of contact windows for 193-nm lithography;Kroyan,1999
4. Mask considerations for manufacturing assist features;Choi,2001
5. Optimizing style options for sub-resolution assist features;Liebmann,2001