Characterization of dry developed processes using silylation application to the PRIME process-Reference-Cited by-同舟云学术

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Characterization of dry developed processes using silylation application to the PRIME process

Published:1990-06-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pierrat Christophe¹,Bono Hubert²,Vinet Francoise²,Mourier Thierry²,Chevallier Michele²,Guibert Jean C.²

Affiliation:

1. LETI/CENG (USA)

2. LETI/CENG (France)

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemical Amplification Resists for Microlithography;Microlithography · Molecular Imprinting;2005-02-03

2. Liquid phase silylation of a bilayer resist system using blended deep-UV resists;Microelectronic Engineering;1999-08

3. Liquid phase silylation of a bilayer resist system;Microelectronic Engineering;1999-08

4. Photoresist silylation and "swelling": simulation using finite element analysis and physical boundary movement algorithms;SPIE Proceedings;1999-06-11

5. A New Photochemical Selective Silylation Technique for Resist Materials;Japanese Journal of Applied Physics;1994-05-15

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