Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication-Reference-Cited by-同舟云学术

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Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Published:2000-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Fritze Michael,Burns James M.,Wyatt Peter W.,Astolfi David K.,Forte T.,Yost Donna,Davis Paul,Curtis Andrew V.,Preble Douglas M.,Cann Susan G.,Denault Sandy,Liu Hua-Yu,Shaw Joe C.,Sullivan Neal T.,Brandom Robert,Mastovich Martin E.

Publisher

SPIE

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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