1. Transform designs to chips, an end user point of view on mask making;Chen,2012
2. K. Standiford, private communication, and Future Fab Int., v.45 46 (2013)
3. Reduction of image placement error on photomask-making for multiple patterning;Hiromatsu,2014
4. Modeling of charging effect and its correction by EB mask writer EBM-6000;Nakayamada,2008
5. Characterization of decay component of resist surface charging on EBM-8000;Nakayamada,2014