Author:
Hien Stefan,Angood Steve,Ashworth Dominic,Basset Steve,Bloomstein Theodore M.,Dean Kim R.,Kunz Roderick R.,Miller Daniel A.,Patel Shashikant,Rich Georgia K.
Cited by
36 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Overview of Wafer Contamination and Defectivity;Handbook of Silicon Wafer Cleaning Technology;2018
2. Sculpting Nanometric Patterns: The Top-down Approach;Ideas in Chemistry and Molecular Sciences;2010-06-09
3. Quantitative measurement of resist outgassing during exposure;Advances in Resist Materials and Processing Technology XXVI;2009-03-13
4. Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009
5. KrF bilayer resist defects: cause, analysis, and reduction;Advances in Resist Materials and Processing Technology XXV;2008-03-14