Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime-Reference-Cited by-同舟云学术

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Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime

Published:2005-05-12 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XVIII
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Author:

Finders Jo,Dusa Mircea

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Scanner-to-scanner CD analysis and control in an HVM environment;SPIE Proceedings;2017-03-24

2. Experimental proximity matching of ArF scanners;SPIE Proceedings;2008-11-20

3. Tool-to-tool optical proximity effect matching;Optical Microlithography XXI;2008-03-14

4. Laser bandwidth and other sources of focus blur in lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2006-10-01

5. Meeting critical gate linewidth control needs at the 65 nm node;SPIE Proceedings;2006-03-10

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