1. Fast and accuate 3D mask model for full-chip OPC and verification,;Liu,2007
2. Full-chip OPC and verification with a fast mask 3D model,;Huang,2011
3. A full-chip 3D computational lithography framework,;Liu,2012
4. Accurate prediction of 3D mask topography induced best focus variation in full-chip photolithography applications;Liu,2011
5. Approximation of three dimensional mask effects with two dimensional features,;Bai,2005