Optimizing performance in cross-linking negative-tone molecular resists-Reference-Cited by-同舟云学术

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Optimizing performance in cross-linking negative-tone molecular resists

Published:2015-03-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Patterning Materials and Processes XXXII
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Author:

Lawson Richard A.,Narcross Hannah,Sharp Brandon,Chun Jun Sung,Neisser Mark,Tolbert Laren M.,Henderson Clifford L.

Publisher

SPIE

Reference17 articles.

1. Methods to explore and prevent pattern collapse in thin film lithography;Noga,2010

2. Molecular glass resists for next generation lithography;De Silva,2008

3. Negative-tone molecular resists based on cationic polymerization;Lawson,2009

4. Non-traditional resist designs using molecular resists: positive tone cross-linked and non-chemically amplified molecular resists;Lawson,2010

5. Small

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist;Advanced Materials Interfaces;2023-06-16

2. Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11

3. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016

4. Negative-tone organic molecular resists;Materials and Processes for Next Generation Lithography;2016

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