1. Sugie, N., Shiobara, E., and Itani, T., “The effect of EUV resist material composition on RLS trade-off,” to be presented at 2013 International Symposium on Extreme Ultraviolet Lithography (October 2013).
2. Sugie, N., Takahashi, T., and Itani, T., “EUV resist material development at EIDEC,” to be presented at 2012 International Symposium on Extreme Ultraviolet Lithography (September 2012).
3. Resolution capability of SFET with slit and dipole illumination
4. Radiation Chemistry in Chemically Amplified Resists
5. Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography