1. Characterizing the 65nm through-pitch sensitivity to scanner;Shieh,2009
2. Scatterometry measurement precision and accuracy below 70nm in Metrology, Inspection, and Process Control for Microlithography XVII;Sendelbach,2003
3. Production control of shallow trench isolation (STI) at the 130-nm node using spectroscopic ellipsometry-based profile metrology;Peters,2004
4. Optimization of scatterometry parameters for shallow trench isolation (STI) monitor;Leray,2004
5. Impact of shrinking measurement error budgets on qualification metrology sampling and cost;Sendelbach,2014