A study on enhancing EUV resist sensitivity (2)-Reference-Cited by-同舟云学术

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A study on enhancing EUV resist sensitivity (2)

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Sekiguchi Atsushi,Isono Mariko,Matsumoto Yoko,Naito Michiya,Utsumi Yoshiyuki,Harada Tetsuo,Watanabe Takeo

Publisher

SPIE

Reference14 articles.

1. Recent progress in nanoparticle photoresists development for EUV lithography;Kasahara,2016

2. Positive tone oxide nanoparticle EUV (ONE) photoresists;Mufei,2016

3. A numeric model for the imaging mechanism of metal oxide EUV resists;Hinsberg,2017

4. A Study of EUV Resist Sensitivity by using metal materials;Sekiguchi,2015

5. A Study on Enhancing EUV Resist sensitivity;Sekiguchi,2017

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparison of photoresist sensitivity between KrF, EB, and EUV exposure;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

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