Triple patterning lithography layout decomposition using end-cutting
Author:
Affiliation:
1. University of Texas at Austin, ECE Department, Austin, Texas 78712, United States
2. Cadence Design Systems, 12515-7 Research Boulevard, Austin, Texas 78759, United States
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Scalable layout decomposition implemented by a distribution evolutionary algorithm;Integration;2024-03
2. Adaptive Layout Decomposition With Graph Embedding Neural Networks;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2022-11
3. OpenMPL: An Open-Source Layout Decomposer;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2021-11
4. Adaptive Layout Decomposition with Graph Embedding Neural Networks;2020 57th ACM/IEEE Design Automation Conference (DAC);2020-07
5. Fast lithography aerial image calculation method based on machine learning;Applied Optics;2017-08-03
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