Gradient-based joint source polarization mask optimization for optical lithography-Reference-Cited by-同舟云学术

Gradient-based joint source polarization mask optimization for optical lithography

Published:2015-05-05 Issue:2 Volume:14 Page:023504
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ma Xu¹,Dong Lisong¹,Han Chunying¹,Gao Jie¹,Li Yanqiu¹,Arce Gonzalo R.²

Affiliation:

1. Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China

2. University of Delaware, Department of Electrical and Computer Engineering, Newark, Delaware 19716, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference49 articles.

1. Optimum mask and source patterns to print a given shape

2. Toward automatic mask and source optimization for optical lithography

3. Layout and source dependent transmission tuning

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