Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference42 articles.
1. P.-Y. Yan , “Masks for extreme ultraviolet lithography,” Chapter 11 inHandbook of Photomask Manufacturing Technology, S. A. Rizvi , ed., CRC Press, Boca Raton, (2005).
2. Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy
3. Imaging properties of the extreme ultraviolet mask
4. U. Micken and M. Lowisch , “Discussion of a simple EUV reticle model,” inProc. EMLC, pp. 243 (2005).
5. Image formation in extreme ultraviolet lithography and numerical aperture effects
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