Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography-Reference-Cited by-同舟云学术

Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

Published:2022-11-23 Issue:06 Volume:4 Page:
ISSN:2577-5421
Container-title:Advanced Photonics
language:
Short-container-title:Adv. Photon.

Author:

Zhu Dazhao¹,Xu Liang²,Ding Chenliang¹,Yang Zhenyao¹,Qiu Yiwei¹,Cao Chun¹,He Hongyang³,Chen Jiawei³,Tang Mengbo¹,Zhan Lanxin¹,Zhang Xiaoyi¹,Sun Qiuyuan¹,Ma Chengpeng¹,Wei Zhen¹,Liu Wenjie¹,Fu Xiang⁴,Kuang Cuifang¹,Li Haifeng¹,Liu Xu¹

Affiliation:

1. Zhejiang Lab, Research Center for Intelligent Chips and Devices, Hangzhou, China

2. Zhejiang University, College of Optical Science and Engineering, State Key Laboratory of Modern Optical Instrumentation, Hangzhou, China

3. Zhejiang University, College of Control Science and Engineering, State Key Laboratory of Industrial Control Technology, Hangzhou, China

4. Zhejiang Lab, Research Center for Humanoid Sensing, Zhejiang Lab, Hangzhou, China

Funder

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Publisher

SPIE-Intl Soc Optical Eng

Subject

Biomedical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference50 articles.

1. 120 nm resolution and 55 nm structure size in STED-lithography

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4. Characterization of nanostructures fabricated with two-beam DLW lithography using STED microscopy

5. Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy

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