Stochastic printing failures in EUV lithography-Reference-Cited by-同舟云学术

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Stochastic printing failures in EUV lithography

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
language:
Short-container-title:

Author:

De Bisschop Peter,Hendrickx Eric

Publisher

SPIE

Reference21 articles.

1. Moore’s law at and beyond 5 nm;Borodovsky,2018

2. Current challenges and opportunities for EUV Lithography;Levinson,2018

3. “Closing remarks of the ‘2017 EUVL Symposium’” Monterey, California, 2017 (unpublished)

4. Impact of Resist Parameters on Stochastic EUV Printability Failures;Hoshiko;Int. Symp. on EUVL,2014

5. Novel EUV resist materials for 7 nm node and beyond;Furutani,2018

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