Electromagnetic field modeling for defect detection in 7 nm node patterned wafers

Author:

Zhu Jinlong1,Zhang Kedi1,Davoudzadeh Nima1,Wang Xiaozhen1,Goddard Lynford L.1

Affiliation:

1. Univ. of Illinois at Urbana-Champaign (United States)

Publisher

SPIE

Reference20 articles.

1. The limits and extensibility of optical patterned defect inspecction,;Silver,2010

2. Role of local fields and defects in the nonlinear response of metal nanostructures,;Kauranen,2008

3. Near-Field Plates: Subdiffraction Focusing with Patterned Surfaces

4. Near-field optical microscopy characterization of IC metrology,;Toledo-Crow,1994

5. Use of TSOM for sub-11nm node pattern defect detection and HAR features,;Arceo,2013

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