Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. ITRS website, http://www.itrs.net/.
2. A. Vaglio Pret and R. Gronheid , “Mask line roughness contribution in EUV lithography,” Microelectron. Eng. (2011).10.1016/j.mee.2011.02.015
3. Spatial scaling metrics of mask-induced line-edge roughness
4. Impact of EUV mask absorber defect with pattern-roughness on lithographic images
5. Resist pattern prediction at EUV
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献