E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making-Reference-Cited by-同舟云学术

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E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making

Published:1989-08-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pongratz Siegfried¹,Demmeler Rita¹,Ehrlich Christian¹,Kohlmann Klaus¹,Reimer Klaus¹,Dammel Ralph²,Hessemer Wolfgang²,Lingnau Jurgen²,Scheunemann Ude²,Theis Jurgen²

Affiliation:

1. Fraunhofer-Institut fur Mikrostrukturtechnik (Germany)

2. Hoechst AG (Germany)

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Small aperture fabrication for single quantum dot spectroscopy;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11

3. Transfer of single-layer positive resist sub-micrometer and nanometer structures into silicon;Microelectronic Engineering;1994-05

4. Microlithography: An overview;Advanced Materials for Optics and Electronics;1994-03

5. Characterization of AZ PN114 resist for soft-x-ray projection lithography;Applied Optics;1993-12-01

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