Optical metrology solutions for 10nm films process control challenges-Reference-Cited by-同舟云学术

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Optical metrology solutions for 10nm films process control challenges

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Mahendrakar Sridhar¹,Vaid Alok¹,Venkataraman Kartik²,Lenahan Michael¹,Seipp Steven¹,Fang Fang¹,Saxena Shweta¹,Hu Dawei²,Yoon Nam Hee²,Song Da²,Camp Janay²,Ren Zhou²

Affiliation:

1. GLOBALFOUNDRIES (United States)

2. KLA-Tencor Corp. (United States)

Publisher

SPIE

Reference5 articles.

1. Enhancing scatterometry CD signal-to-noise ratio for 1x logic and memory challenges;Shaughnessy,2013

2. Use of multiple azimuthal angles to enable advanced scatterometry applications;Sendelbach,2010

3. Optical Metrology for Directed Self-assembly Patterning Using Mueller Matrix Spectroscopic Ellipsometry Based Scatterometry;Dixit,2015

4. [Leakage Current and Defect Characterization of Short Channel MOSFETs;Roll,2012

5. New comprehensive metrics and methodology for metrology tool fleet matching

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-14

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