1. Model-based OPC using the MEEF matrix;Nick,2002
2. Model-based OPC using the MEEF matrix II;Junjiang,2014
3. A feasible model-based OPC algorithm using Jacobian matrix of intensity distribution functions;Ye,2007
4. Considering MEEF in inverse lithography technology and source mask optimization;Pang,2008
5. Impact of mask variations on CD and placement in resist: local vs global effects;Mernier,2022