Machine learning methods applied to process qualification

Author:

Utzny Clemens S.,Meusemann Stefan,Herrmann Mark

Publisher

SPIE

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1. Necessity is the mother of invention: support vector machines for CD control;35th European Mask and Lithography Conference (EMLC 2019);2019-08-29

2. Deal gently with the bird you are trying to catch: small scale CD control with machine learning;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27

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