Investigation on reticle heating effect induced overlay error-Reference-Cited by-同舟云学术

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Investigation on reticle heating effect induced overlay error

Published:2014-04-02 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Metrology, Inspection, and Process Control for Microlithography XXVIII
language:
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Author:

Lim Mijung,Kim Geunhak,Kim SeoMin,Lee Byounghoon,Kim Seokkyun,Lim Chang-moon,Kim Myoungsoo,Park Sungki

Publisher

SPIE

Reference2 articles.

1. Effects of chrome pattern characteristics on image placement due to thermomechanical distortion of optical reticles during exposure

2. Modeling of mask thermal distortion and its dependency on pattern density;Zhang,2005

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography mask thermal and stress effect for the machine overlay compensation;Journal of Vacuum Science & Technology B;2024-07-01

2. NXT:1980Di immersion scanner for 7nm and 5nm production nodes;SPIE Proceedings;2016-03-15

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