The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information-Reference-Cited by-同舟云学术

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The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Published:2016-05-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Park Won Joo,Lee Hyung-Joo,Han Yoon Taek,Choi Seuk Hwan,Han Hak Seung,Chung Dong Hoon,Jeon Chan-Uk,Ogiso Yoshiaki,Shida Soichi,Matsumoto Jun,Nakamura Takayuki

Publisher

SPIE

Reference2 articles.

1. Novel CD-SEM measurement methodology for complex OPCed patterns;Lee,2014

2. A Novel Method to Quantify the Complex Mask Patterns;Tung,2016

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours and feed forward intra CDU by mask MTT;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

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