Author:
Demir Abdullah,Zhao Guowei,Freisem Sabine,Liu Xiaohang,Deppe Dennis G.
Cited by
2 articles.
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1. Efficient Tunnel Junction Lithographic Aperture 940 nm VCSEL;IEEE Photonics Technology Letters;2023-04-01
2. Wavelength-scale lithographic VCSELs;2021 27th International Semiconductor Laser Conference (ISLC);2021-10-10