Infrared nanospectroscopy characterization of metal oxide photoresists-Reference-Cited by-同舟云学术

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Infrared nanospectroscopy characterization of metal oxide photoresists

Published:2022-12-06 Issue:04 Volume:21 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Zhao Xiao¹,Wu Cheng Hao (Will)²,Bechtel Hans A.³,Weidman Timothy²,Salmeron Miquel B.¹

Affiliation:

1. University of California, Berkeley, Department of Materials Science and Engineering, Berkeley, California, United States

2. Lam Research Corporation, Fremont, California, United States

3. Lawrence Berkeley National Laboratory, Advanced Light Source, Berkeley, California, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Arts and Humanities

Reference23 articles.

1. Breaking stochastic tradeoffs with a dry deposited and dry developed EUV photoresist system

2. Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy

3. X-ray-Induced Fragmentation of Imidazolium-Based Ionic Liquids Studied by Soft X-ray Absorption Spectroscopy

4. Quantitative Analysis of Electron Beam Damage in Organic Thin Films

5. Advanced FTIR technology for the chemical characterization of product wafers;Rosenthal,2001

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synchrotron Near-Field Infrared Nanospectroscopy and Nanoimaging of Lithium Fluoride in Solid Electrolyte Interphases in Li-Ion Battery Anodes;ACS Nano;2024-05-24

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