Process margin improvement through finger-print removal based on scanner leveling data-Reference-Cited by-同舟云学术

Process margin improvement through finger-print removal based on scanner leveling data

Published:2017-04-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Kim Young Jun¹,Park Tony¹,Kong Jeong Heung¹,Han Dong Kyung¹,Choi Jin Phil¹,Kang Young Seog¹,Jang Se Yeon¹,Cottaar Jeroen²,van Delft Jan-Pieter²,Rutten Jeroen²,von Sydow Axel²,Bontekoe Marcel²,Boogaarts Maarten²,Donkerbroek Arjan²,Ouyang Ruiyue²,Rangarajan Balaji²,Elbattay Khalid²,Moe Andrew³,Kim Chung-Yong³

Affiliation:

1. SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

2. ASML Netherlands B.V. (Netherlands)

3. ASML Korea Co., Ltd. (Korea, Republic of)

Publisher

SPIE

Reference9 articles.

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2. I. McDonnell, and J. Ayres, [Metrological apparatus for measuring surface characteristics] U.S. Patents 8051576, (2011).

3. SSEST: A new approach to higher accuracy cylindricity measuring instrument

4. Single-step spatial rotation error separation technique for the ultraprecision measurement of surface profiles

5. [Taylor Hobson PGI Dimension Technical reference brochure] Taylor Hobson Ltd, 2013 (2013). http://www.taylor-hobson.com/products/10/107.html

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