<title>Experimental and simulation studies of alignment marks

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Experimental and simulation studies of alignment marks

Published:1991-07-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Wong Alfred K. K.,Doi Takeshi,Dunn Diana D.,Neureuther Andrew R.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Alignment mark signal simulation system for the optimum mark feature selection;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-04-01

2. Rigorous simulation of alignment for microlithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2003-07-01

3. Rigorous electromagnetic simulation applied to alignment systems;SPIE Proceedings;2001-09-14

4. Massively parallel electromagnetic simulation for photolithographic applications;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;1995

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