Optimized parameters selected on the basis of the development defect model-Reference-Cited by-同舟云学术

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Optimized parameters selected on the basis of the development defect model

Published:2018-12-20 Issue:04 Volume:17 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ma Ling¹,Xu Buqing¹,Wu Qiang²,Dong Lisong³,Fan Taian³,Jiang Yuntao⁴,Wei Yayi¹

Affiliation:

1. University of Chinese Academy of Sciences, School of Microelectronics, Beijing

2. Shanghai IC R&D Center, Shanghai

3. Institute of Microelectronics of the Chinese Academy of Sciences, Beijing

4. Semiconductor Manufacturing International Corp., Shanghai

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 浸没式光刻机浸液系统污染控制研究现状及进展;Laser & Optoelectronics Progress;2022

2. Investigation of Photothermal Effects on the Liquid Field during the Exposure Process in Immersion Lithography;Journal of Physics: Conference Series;2019-06-01

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