Fundamental understanding and experimental verification of bright versus dark field imaging-Reference-Cited by-同舟云学术

Fundamental understanding and experimental verification of bright versus dark field imaging

Published:2020-10-30 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet Lithography 2020
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Author:

Davydova Natalia V.,Finders Jo,McNamara John,van Setten Eelco,van Lare Claire,Franke Joern-Holger,Frommhold Andreas,Capelli Renzo,Kersteen Grizelda,Verch Andreas,Carpaij Rene,Zekry Joseph,Fliervoet Timon

Publisher

SPIE

Reference11 articles.

1. Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

2. Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation);Andrew,2020

3. Progress in EUV resists towards high-NA EUV lithography

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