Limitations of proximity-effect corrections for electron-beam patterning of planar photonic crystals-Reference-Cited by-同舟云学术

Limitations of proximity-effect corrections for electron-beam patterning of planar photonic crystals

Published:2005-04-01 Issue:4 Volume:44 Page:043401
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Wu¨est Robert

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference29 articles.

1. J. D. Joannopoulos, R. D. Meade, and J. N. Winn,Photonic Crystals: Molding the Flow of Light, Princeton University Press, Princeton, NJ (1995).

2. Light Localizations in Photonic Crystal Line Defect Waveguides

3. Photonic crystals in the optical regime â past, present and future

4. Design and optimization of an achromatic photonic crystal bend

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A simple method to calculate incident dose for the proximity effect correction;The European Physical Journal Applied Physics;2022

2. Degassing and Cycling of Mercury at Nisyros Volcano (Greece);Geofluids;2019-08-14

3. Electron Beam Lithography of Nanostructures;Reference Module in Materials Science and Materials Engineering;2016

4. Variation of backscatter electron intensity;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11

5. Proximity error correction method for continuous moving stage electron beam writing;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-09