Calcium fluoride for ArF laser lithography: characterization by in-situ transmission and LIF measurements-Reference-Cited by-同舟云学术

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Calcium fluoride for ArF laser lithography: characterization by in-situ transmission and LIF measurements

Published:2003-05-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
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Author:

Muehlig Christian,Triebel Wolfgang,Toepfer Gabriela,Jordanov A.

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Transient optical absorption in calcium fluoride crystals;Radiation Physics and Chemistry;2022-02

2. Transmissivity testing of calcium fluoride windows under high pulse repetition rate laser irradiation at 193nm;Pacific-Rim Laser Damage 2018: Optical Materials for High-Power Lasers;2018-06-05

3. Influence of Na-related defects on ArF laser absorption in CaF2;Applied Physics B;2010-03-19

4. Pulse stretcher with variable pulse length for excimer laser applications;Review of Scientific Instruments;2010-03

5. Nonlinear absorption in single LaF_3 and MgF_2 layers at 193 nm measured by surface sensitive laser induced deflection technique;Applied Optics;2009-12-03

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