Process optimization for waveguide fabrication by liftoff processing in layers deposited by pulsed laser-Reference-Cited by-同舟云学术

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Process optimization for waveguide fabrication by liftoff processing in layers deposited by pulsed laser

Published:2024-06-18 Issue: Volume:6 Page:35
ISSN:
Container-title:Integrated Photonics Platforms III
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Author:

Bernard Antoine,Péreira Antonio,Orobtchouk Régis,Cleyet-Merle Etienne,Grillet Christian,Chauvin Nicolas,Guy Stephan,Guyot Yannick,Gassenq Alban

Publisher

SPIE

Reference29 articles.

1. The potential and global outlook of integrated photonics for quantum technologies

2. Crack-Free Silicon-Nitride-on-Insulator Nonlinear Circuits for Continuum Generation in the C-Band;Dirani,2018

3. Rare-earth doped micro-emitters made by lift-off processing in pulsed laser deposited layers on Si substrate

4. The Effect of Novel Synthetic Methods and Parameters Control on Morphology of Nano-alumina Particles

5. Rare-earth ion doped Al 2 O 3 for active integrated photonics;Hendriks;Advances in Physics: X,2021

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