Plasma-ion-assisted deposition: investigation of film stress-Reference-Cited by-同舟云学术

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Plasma-ion-assisted deposition: investigation of film stress

Published:1996-08-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Zoeller Alfons,Goetzelmann Rainer,Matl K.

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Coating-relevant properties of high-index optical polymers for automotive applications;Applied Optics;2021-04-20

2. Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control;Acta Mechanica Sinica;2012-10

3. Influence of the film structure on the properties of electrochromic CeO2 thin films deposited by e-beam PVD;Thin Solid Films;2004-01

4. Characteristics of e-beam deposited electrochromic CeO2 thin films;Solid State Ionics;2003-12

5. High-reflectivity HfO_2/SiO_2 ultraviolet mirrors;Applied Optics;2002-06-01

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