1. Resist blur and line edge roughness;Gallatin,2005
2. Shot noise, LER and quantum efficiency of EUV photoresists;Brainard,2004
3. The shot noise impact on resist roughness in EUV lithography;Hutchinson,1998
4. Line edge roughness in sub-0.18-μm Resist Patterns;Palmateer,1998
5. Characterization of line edge roughness in photoresist using an image fading technique;Pawloski,2004