1. Defect reduction by using point-of-use filtration in new coater/developer;Umeda,2009
2. Analysis of the Effect of Point-of-Use Filtration on Microbridging Defectivity;Braggin,2009
3. Defect performance of a 2X node resist with a revolutionary point-of-use filter;Braggin,2010
4. The effectiveness of sub 50nm filtration on reduced defectivity in advanced lithography applications;Gotlinsky,2003
5. Research of appropriate filter membrane for reducing defects of ArF lithography;Umeda,2005