Tailored molecular glass resists for scanning probe lithography-Reference-Cited by-同舟云学术

Tailored molecular glass resists for scanning probe lithography

Published:2015-03-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Patterning Materials and Processes XXXII
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Author:

Neuber Christian,Schmidt Hans-Werner,Strohriegl Peter,Ringk Andreas,Kolb Tristan,Schedl Andreas,Fokkema Vincent,van Veghel Marijn G. A.,Cooke Mike,Rawlings Colin,Dürig Urs,Knoll Armin,de Marneffe Jean- François,el Otell Ziad,Kaestner Marcus,Krivoshapkina Yana,Budden Matthias,Rangelow Ivo W.

Publisher

SPIE

Reference17 articles.

1. Photo- and electroactive amorphous molecular materials—molecular design, syntheses, reactions, properties, and applications

2. Novel class of low molecular‐weight organic resists for nanometer lithography

3. Recent Development in Molecular Resists for Extreme Ultraviolet Lithography

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