1. Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair;Pang,2012
2. Three-dimensional integrated circuits
3. Gaps analysis for CD metrology beyond the 22nm node;Bunday,2013
4. Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation;Burger,2005
5. Benchmark of rigorous methods for electromagnetic field simulation;Burger,2008