From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute-Reference-Cited by-同舟云学术

From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

Published:2016-09-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Buitrago Elizabeth¹,Fallica Roberto¹,Fan Daniel¹,Karim Waiz¹,Vockenhuber Michaela¹,van Bokhoven Jeroen A.²,Ekinci Yasin¹

Affiliation:

1. Paul Scherrer Institute (Switzerland)

2. ETH Zurich (Switzerland)

Publisher

SPIE

Reference25 articles.

1. Extreme ultraviolet interference lithography with incoherent light;Naulleau,2007

2. Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography;Buitrago,2016

3. The road towards single digit nanometer resolution patterning in mass production: State-of-the-art EUV resists platforms compared;Buitrago,2015

4. Evaluation of EUV Resist Performance Using Interference Lithography;Buitrago,2015

5. Extreme ultraviolet interference lithography at the Paul Scherrer Institut

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