In-situ Particulate Contamination Studies In Process Plasmas-Reference-Cited by-同舟云学术

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In-situ Particulate Contamination Studies In Process Plasmas

Published:1990-01-30 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Selwyn Gary S.¹,McKillop John S.²,Haller Kurt L.¹

Affiliation:

1. IBM Thomas J. Watson Research Center (United States)

2. Laser Photonics, Inc. (United States)

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modification of discharge sequences to control the random dispersion of flake particles during wafer etching;Journal of Vacuum Science & Technology B;2023-11-14

2. Continuous detection of particles on a rotating substrate during thin film deposition;Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference;2018-11-19

3. Time resolved detection of particle contamination during thin film deposition;Advances in Optical Thin Films VI;2018-06-05

4. Detection and modelling of electrode topography effects on particle traps;Plasma Sources Science and Technology;1994-08-01

5. Detection of particle traps by spatially resolved optical emission spectroscopy over grooved electrodes in radio frequency discharges;Applied Physics Letters;1993-12-13

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