Evaporated resist for the fabrication and replication of LEEPL mask-Reference-Cited by-同舟云学术

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Evaporated resist for the fabrication and replication of LEEPL mask

Published:2004-05-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Cloutier Melanie,Awad Yousef,Lavallee Eric,Turcotte David,Beauvais Jacques,Drouin Dominique,Kien Mun Lau,Yang Pan,Lafrance Pierre,Legario Ron,Yoshida Akira,Nozue Hiroshi

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Three-dimensional Nanofabrication in Si Using Electron Beam Lithography;NTT Technical Review;2014-02

2. Electron beam lithography on vertical side faces of micrometer-order Si block;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-07

3. Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist;SPIE Proceedings;2005-05-06

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