Author:
Gehoski Kathleen A.,Resnick Douglas J.,Dauksher William J.,Nordquist Kevin J.,Ainley Eric,McCord Mark,Raphaelian Mark,Hess Harald
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Mitigation of microloading effect in nanoimprint mask fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009
2. Dimensional stability in step & repeat UV-nanoimprint lithography;Microelectronic Engineering;2007-05