1. The International Technology Roadmap for Semiconductors (San Jose: Semiconductor Industry Association, 2014); available from the Internet: http://member.itrs.net.
2. Gaps Analysis for CD Metrology Beyond the 22 nm Node;B.,2013
3. CD-SEM metrology for sub-10 nm width features;Bunday,2014
4. Scanning electron microscopy imaging of ultra-high aspect ratio hole features;Cepler,2012
5. Novel metrology methods for fast 3D characterization of directed selfassembly (DSA) patterns for high volume manufacturing;Sarma,2014