Track integrated backside cleaning solution: impact of backside contamination on printing distortions-Reference-Cited by-同舟云学术

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Track integrated backside cleaning solution: impact of backside contamination on printing distortions

Published:2023-05-29 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XL
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Author:

Santos Andreia,Zanders Wesley,Caron Elke,Harumoto Masahiko,Vandereyken Jelle,Hermans Jan V.,Truffert Vincent,Halder Sandip,Otten Ronald,van Dijk Leon,van Haren Richard

Publisher

SPIE

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pattern deformation mitigation for EUV photoresists using wafer backside cleaning techniques;Japanese Journal of Applied Physics;2024-03-01

2. Track integrated backside cleaning towards high-NA EUV: correlation of backside contamination with frontside patterning performance;International Conference on Extreme Ultraviolet Lithography 2023;2023-12-01

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